CMOS Digital Integrated Circuits: Analysis & Design, 4th Edition - InfoscienceNote that ox 3. The gate oxide capacitance per unit area is calculated using the dielectric constant of silicon dioxide and the oxide thickness tox. Determine the capacitance when the diffusion area is biased at 1. In this problem, assume that there is no channel-stop implant. Are they identical? If not, how would you express L in terms of LM and other parameters?
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CMOS Digital Integrated Circuits: Analysis & Design, 4th Edition
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